Optimization of Fluorine-based Plasma Etching Processes to Etch Silicon Nitride Nanostructures

Abubaker Mustafa Tareki; Boris Le Drogoff; Mohamed Chaker

doi:10.1364/IPRSN.2021.IM4A.4

OSA Advanced Photonics Congress 2021
OSA Technical Digest (Optica Publishing Group, 2021),
paper IM4A.4
•https://doi.org/10.1364/IPRSN.2021.IM4A.4

Optimization of Fluorine-based Plasma Etching Processes to Etch Silicon Nitride Nanostructures

Abubaker Mustafa Tareki, Boris Le Drogoff, and Mohamed Chaker

Integrated Photonics Research, Silicon and Nanophotonics 2021

Washington, DC United States
26–29 July 2021
ISBN: 978-1-943580-94-1

From the session
Novel Fabrication Processes and Solutions II (IM4A)

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
A. M. Tareki, B. Le Drogoff, and M. Chaker, "Optimization of Fluorine-based Plasma Etching Processes to Etch Silicon Nitride Nanostructures," in OSA Advanced Photonics Congress 2021, B. Yang, F. Leo, A. Tauke-Pedretti, S. Arafin, M. Clerici, L. Caspani, L. Busse, M. Kats, J. Fan, W. Ming (Steve) Lee, D. Caplan, N. Parsons, W. Freude, C. Tremblay, D. Hillerkuss, K. Igarashi, H. Elgala, N. Guerrero Gonzalez, R. "Patty" Stabile, K. Jaeger, R. Saive, H. Aziz, and H. Tan, eds., OSA Technical Digest (Optica Publishing Group, 2021), paper IM4A.4.

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Get Video
Citation alert
Save article

Abstract

Controlled plasma etching processes based on fluorine-based plasmas to fabricate nanostructure in silicon nitride material are reported. These processes were optimized in terms of etch rate, sidewall profile and selectivity over resist mask material.

PDF Article | Presentation Video

More Like This

Anisotropic reactive ion etching of InP in methane/hyclrogen based plasmas

J. W. McNabb, H. G. Craighead, and H. Temkin
TuD15 Integrated Photonics Research (IPR) 1991

Plasma-etched GaAs optomechanical microdisks fabricated with an electro-lithographic soft mask

Rodrigo Benevides, Michaël Ménard, Gustavo S. Wiederhecker, and Thiago P. M. Alegre
W4D.2 Latin America Optics and Photonics Conference (LAOP) 2018

High Q Microresonators Based on Epitaxial GaN Film

Yanzhen Zheng, Changzheng Sun, Bing Xiong, Lai Wang, Jian Wang, Yanjun Han, Zhibiao Hao, Hongtao Li, Jiadong Yu, and Yi Luo
SM4R.2 CLEO: Science and Innovations (CLEO:S&I) 2020

Previous Article Next Article

Presentation Video

Presentation video access is available to:

Optica Publishing Group subscribers
Technical meeting attendees
Optica members who wish to use one of their free downloads. Please download the article first. After downloading, please refresh this page.

Contact your librarian or system administrator
or
Log in to access Optica Member Subscription or free downloads