Characterization of multilayer rough surfaces using surface plasmon spectroscopy

E. FONTANA; RICHARD H. PANTELL

International Quantum Electronics Conference
OSA Technical Digest (Optica Publishing Group, 1986),
paper THDD5

Characterization of multilayer rough surfaces using surface plasmon spectroscopy

E. FONTANA and RICHARD H. PANTELL

International Quantum Electronics Conference 1986

San Francisco, California United States
9–13 June 1986
ISBN: 0-936659-11-4

From the session
Surface Photophysics (THDD)

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E. FONTANA and R. H. PANTELL, "Characterization of multilayer rough surfaces using surface plasmon spectroscopy," in International Quantum Electronics Conference, M. Richardson, C. Tang, D. Grischkowsky, and T. Hansch, eds., OSA Technical Digest (Optica Publishing Group, 1986), paper THDD5.

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Abstract

Surface plasmon spectroscopy has been suggested as a tool for investigating perturbations on metallic surfaces.¹ This technique has been applied to the study of thin dielectric films² to characterize rough metal–air interfaces³ and as immunosensors.⁴ An important feature is that the dimension of the perturbation can be 3 orders of magnitude less than the wavelength of the probing radiation.

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