Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • International Conference on Quantum Electronics
  • OSA Technical Digest (Optica Publishing Group, 1988),
  • paper MC4

FUNDAMEMTAL PROCESS DIAGNOSTICS IN OPTICAL CVD ENVIRONMEMT WITH LASER SPECTROSCOPY

Not Accessible

Your library or personal account may give you access

Abstract

Laser induced chemical vapor deposition (CVD) has been paid a great attention. In order to understand details of the process, knowledge about fundamental constants, such as the reaction, the diffusion, and the trapping (onto the substrate) coefficients is important. This paper describes the measurements of these constants by the laser induced fluorescence spectroscopy (LIF), applying the gas-phase process In C2H2 photolyzed by an ArF laser, by which it is known to deposit diamond-like thin films [1] Tracing temporal and spatial behaviours of C2 radicals produced by the photolysis, we determined the diffusion coefficient of the C2 radicals experimentally for the first, time, together with its reaction coefficient for C2H2 Two-photon excitation spectroscopy was also applied to detect H2 and H2 whose single e-photon excitation by dye lasers is difficult.

© 1988 Optical Society of America

PDF Article
More Like This
Diagnostics of gas phase processes in a laser CVD environment by laser spectroscopy

T. OKADA, H. ANDOU, M. MAEDA, and Kyushu U
FN1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1989

Optical Diagnostics of VUV Laser CVD of Semiconductors

M. Barth, J. Knobloch, and P. Hess
LFA.1 Laser Applications to Chemical and Environmental Analysis (LACSEA) 1996

Laser diagnostic studies of CVD systems

W. Breiland, M. Coltrin, and P. Hargis
WK1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1982

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved