Comparison of MPI processes of SO2 at 308 and 355 nm

ZHAOLIN LI; HOUXIANG LIU; YILE QIAN; JINJIN WANG; CUNKAI WU

International Quantum Electronics Conference
OSA Technical Digest (Optica Publishing Group, 1990),
paper QTHI3

Comparison of MPI processes of SO₂ at 308 and 355 nm

ZHAOLIN LI, HOUXIANG LIU, YILE QIAN, JINJIN WANG, and CUNKAI WU

International Quantum Electronics Conference 1990

Anaheim, California United States
21–25 May 1990
ISBN: 1-55752-145-X

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Poster Session: 3 (QTHI)

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Z. LI, H. LIU, Y. QIAN, J. WANG, and C. WU, "Comparison of MPI processes of SO2 at 308 and 355 nm," in International Quantum Electronics Conference, A. Owyoung, C. Shank, S. Chu, and E. Ippen, eds., Vol. 8 of OSA Technical Digest (Optica Publishing Group, 1990), paper QTHI3.

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Abstract

The research on multiphoton ionization (MPI) time-of-flight mass spectroscopy (TOF MS) of SO₂ in supersonic conditions by using laser radiation of 308 nm of excimer lasers and 355 nm of frequency tripling of the YAG laser is reported.

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