Abstract

Recent experiments in sub-micron optical lithography used a sodium atomic beam propagating in thezdirection and cooled along the $\widehat{\text{z}}$ direction to write a permanent, periodic, submicron grating in the $\widehat{\text{x}}$direction on a silicon substrate by lensing the atomic beam with an optical standing wave field in the $\widehat{\text{x}}$ direction.^[1]The width of the diffraction peaks have not yet been measured. In this paper we show the results of a semi-classical force^[2]simulation without diffusion predicts a width of ≈100 Angstroms, or 2% of λ, the wave length of the optical standing wave field.

© 1992 IQEC