Abstract
One of the motivations for atom optics and laser cooling is the generation of nanometer scale features and devices [1,2]. Most experiments to date have deposited atoms directly onto a substrate. [3-5] Recent experiments have investigated the position localization of atomic distributions.[6] In this paper we demonstrate a high sensitivity and high resolution resist system for neutral energetic metastable atoms. We demonstrate that the resist is insensitive to ground state atoms; this feature makes possible a lithographic technique based on position-dependent quenching via optical pumping as well as a high resolution position detection technique for use in atom optics experiments. [7]
© 1996 Optical Society of America
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