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Conferences > ISOM_ODS > 2005 > WA > WA4

Nano-pattern Profile Control Technology using Reactive Ion Etching for 100 GB Optical Disc Mastering

Megumi Sato, Yasuo Hosoda, Masahiro Katsumura, Kazunobu Hashimoto, Osamu Kasono, Tetsuya Iida, Kazumi Kuriyama, and Fumihiko Yokogawa

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Abstract

For high-density patterning, we tried to control the nano-pattern profile using a reactive ion etching technology. Line edge roughness could be improved and the line width fluctuation 7 nm could be realized.

© 2005 Optical Society of America

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