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Conferences > ISOM_ODS > 2005 > WA > WA6

Patterning of ZnS-SiO2 by Laser Irradiation and Wet Etching Treatment

Hiroshi Miura, Nobuaki Toyoshima, Yoshitaka Hayashi, Suguru Sangu, Noriyuki Iwata, and Junnichi Takahashi

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Abstract

We show a patterning method for ZnS-SiO2, which has sufficient performance for fabricating nanometer-scale patterns. Convex patterns with steep taper profiles were fabricated. Minimum pattern sizes were about one-fourth of a laser beam diameter.

© 2005 Optical Society of America

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