Abstract

CsLiB₆O₁₀ (CLBO) is an excellent nonlinear optical crystal for generating high-power UV output with wavelengths below 300 nm [1]. Laser-induced damage of crystals is one of critical issues for scaling the UV power. Although CLBO has already been put to practical use in several UV laser sources developed for semiconductor inspection and material processing applications, the light scatters are observed in commercial CLBO. The light scatters can significantly reduce device performance by causing optical loss and bulk damage in nonlinear optical crystal. In this study, we investigated the light scatters and the UV laser-induced damage resistance of CLBO.

© 2013 Japan Society of Applied Physics, Optical Society of America