Abstract
There have been growing interests in plasmonic perfect absorbers for wavelength-tunable narrow-band thermal emitters in the past few years [1]. Recently, we have demonstrated a facile method to fabricate metal-insulator-metal (MIM) plasmonic structures using colloidal mask etching that is scalable and cost-effective [2]. Previously, we applied this technique to demonstrate selective thermal emissions in the mid-infrared range using aluminum (Al), as inexpensive and earth-abundant material. In the present work, we fabricated MIM structures with molybdenum (Mo) which is a refractory metal operative in the higher temperature, shorter wavelength range, and with higher emission power.
© 2015 Japan Society of Applied Physics, Optical Society of America
PDF ArticleMore Like This
Thang Duy Dao, Kai Chen, Satoshi Ishii, Akihiko Ohi, Toshihide Nabatame, Masa-hiro Kitajima, and Tadaaki Nagao
25E3_7 Conference on Lasers and Electro-Optics/Pacific Rim (CLEO/PR) 2015
Thang Duy Dao, Kai Chen, Satoshi Ishii, Gandham Lakshminarayana, Akihiko Ohi, Toshihide Nabatame, and Tadaaki Nagao
19a_C3_8 JSAP-OSA Joint Symposia (JSAP) 2014
Jing Zhou, Xi Chen, and L. Jay Guo
FW1C.6 CLEO: QELS_Fundamental Science (CLEO:FS) 2015