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  • JSAP-OSA Joint Symposia 2015 Abstracts
  • (Optica Publishing Group, 2015),
  • paper 13p_2C_8

High-Temperature Wavelength Selective Thermal Emitters Fabricated by Colloidal Mask Etching of Mo-Al2O3-Mo Trilayers

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Abstract

There have been growing interests in plasmonic perfect absorbers for wavelength-tunable narrow-band thermal emitters in the past few years [1]. Recently, we have demonstrated a facile method to fabricate metal-insulator-metal (MIM) plasmonic structures using colloidal mask etching that is scalable and cost-effective [2]. Previously, we applied this technique to demonstrate selective thermal emissions in the mid-infrared range using aluminum (Al), as inexpensive and earth-abundant material. In the present work, we fabricated MIM structures with molybdenum (Mo) which is a refractory metal operative in the higher temperature, shorter wavelength range, and with higher emission power.

© 2015 Japan Society of Applied Physics, Optical Society of America

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