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  • JSAP-OSA Joint Symposia 2015 Abstracts
  • (Optica Publishing Group, 2015),
  • paper 14a_PB3_3

A Polymer Line of 68 nm Achieved in Two-Photon Polymerization Nanofabrication

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Abstract

As one of the latest laser processing technology, femtosecond laser two-photon polymerization nanofabrication has become an international researching focus. The technology uses multi-photon effect and the threshold effect of laser and material. It has realized the nanoscale laser direct writing successfully.[1] Using two-photon polymerization nanofabrication, spatial resolution of 15nm has been achieved with negative SCR500 photoresist.[2-3] However, for most of the fine processing, it is difficult to achieve a smooth and uniform line. Here, we report a stable 68 nm polymer lines with the technology of two-photon polymerization nanofabrication.

© 2015 Japan Society of Applied Physics, Optical Society of America

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