Abstract
With an expansion of fundamental and application research in plasmonics, there is an increasing demand on better materials. In addition to the demand for lowering optical loss, another important and required property is the pro-cessability. Although gold and silver show excellent plas-monic responses, they cannot be nanostructured with selective dry etching techniques. This limitation makes the fabrication of nanostructures of gold and silver complex and tricky. Titanium nitride (TiN) is a promising material having the compatibility with nanofabrication techniques [1]. TiN, which is composed of abundant elements of titanium and nitrogen, has gold-like optical properties together with a high thermal stability and a mechanical toughness. The thin-film fabrication techniques have been established for TiN because of its technological and industrial importance.
© 2016 Japan Society of Applied Physics, Optical Society of America
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