Abstract

Radio frequency plasmas are used in the electronics industry in various phases of microcircuitry processing. Deposition and etching are two key areas where these types of plasmas are used. In recent past, carbon tetrachloride, CC14, has been used in the etching of metals such as aluminum. However, one of the problems associated with using this gas as an etchant is the formation of a glow polymer which coats the walls of the chamber and can interfere with the etching.

© 1994 Optical Society of America