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Conferences > LIC > 2017 > LWA5 > LWA5.10

6.3 eV DUV Generation Based on Microchip Nd:YAG Laser

Yuji Oki, Takashi Ohe, Hiroaki Yoshioka, Koji Kosaka, and Takaaki Kanemaru

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Abstract

Deep ultraviolet light source using passively Q-switch Nd:YAG laser was proposed and designed for soft laser ablation on scanning electron microscopic application. Design wavelength is from 193 nm to 196.7 nm that exceeds 6.3 eV in photon energy for chemical dissociation of organic sample. Frequency mixing of 4th harmonic beam and optical parametric generated red beam are adopted by using flux-less BBO crystal. Initial design of BBO and PPLN-OPG has been performed.

© 2017 Optical Society of America

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