Abstract
Both the analysis and control of chemical vapor deposition (CVD) processes, are greatly aided by the availability of experimental methods for monitoring the gas phase precursors of the depositing material. The real time, in situ detection of intermediate reaction species is an almost essential element in studies directed at understanding the fundamental chemistry and physics of CVD processes. Such studies also can have a major impact on CVD processing practices.
© 1987 Optical Society of America
PDF ArticleMore Like This
J. J. O’Brien, D. C. Miller, and G. H. Atkinson
THC5 Conference on Lasers and Electro-Optics (CLEO:S&I) 1987
William G. Breiland, Pauline Ho, and Michael E. Coltrin
WD1 Lasers in Material Diagnostics (LMD) 1987
WILLIAM G. BRELAND, MICHAEL E. COLTRIN, and PAULINE HO
WI3 Conference on Lasers and Electro-Optics (CLEO:S&I) 1985