Abstract

We report on the deposition of Cu₂O thin films with different experimental parameters by using direct current (DC) magnetron sputtering. Films deposition was controlled by temperature, oxygen flow rate and deposition time. The deposited Cu₂O thin films were characterized by studying crystallographic structure with XRD, and surface morphology by field-emission scanning electron microscopy (FE-SEM). These experimental results revealed that sputtering parameters such as substrate temperature and the O₂ flow rate are the important factor that strongly influencing the formation of high-quality Cu₂O thin films. Our study demonstrated that the optimized high-quality Cu₂O thin films can be utilized for many technological applications such as solar cells, gas sensing and fuel cells.

© 2015 Optical Society of America