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Formation of Optical Trajectories in the Photopolymer Material during Self-Written Waveguides Process

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Abstract

During the self-written waveguides process, the optical waveguide trajectories formed in an AA/PVA a photopolymer material photosensitive at 532 nm are examined. The largest index changes taking place at any time during the exposure, i.e. during SWW formation are found at the positions where the largest light intensity is present.

© 2017 Optical Society of America

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