Ultrashort Laser Pulses in Thin Film Ablation

Shizhou Xiao; Andreas Ostendorf

doi:10.1364/LTST.2012.MF2C.3

International Photonics and Optoelectronics Meetings
OSA Technical Digest (online) (Optica Publishing Group, 2012),
paper MF2C.3
•https://doi.org/10.1364/LTST.2012.MF2C.3

Ultrashort Laser Pulses in Thin Film Ablation

Shizhou Xiao and Andreas Ostendorf

Laser and Tera-Hertz Science and Technology 2012

Wuhan China
1–2 November 2012
ISBN: 978-1-55752-960-2

From the session
Session 6: Laser Micro/Nano Fabrication II: Ultrafast Lasers (MF2C)

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S. Xiao and A. Ostendorf, "Ultrashort Laser Pulses in Thin Film Ablation," in International Photonics and Optoelectronics Meetings, OSA Technical Digest (online) (Optica Publishing Group, 2012), paper MF2C.3.

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Abstract

Selectivity is a major requirement in thin film ablation. Using ultrashort laser pulses allows the precise control of temperature distribution in thin layers. Simulations confirm a significant dependency on the layer material and the irradiation direction.

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