Profiling and Light Scattering Studies of Si Surfaces

E. L. Church; P. Z. Takacs; J. C. Stover

doi:10.1364/MSNP.1995.MFA2

Microphysics of Surfaces Nanoscale Processing
Technical Digest Series (Optica Publishing Group, 1995),
paper MFA2
•https://doi.org/10.1364/MSNP.1995.MFA2

Profiling and Light Scattering Studies of Si Surfaces

E. L. Church, P. Z. Takacs, and J. C. Stover

Microphysics of Surfaces: Nanoscale Processing 1995

Santa Fe, New Mexico United States
9–11 February 1995
ISBN:

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Laser and Optical Surface Analysis (MFA)

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E. L. Church, P. Z. Takacs, and J. C. Stover, "Profiling and Light Scattering Studies of Si Surfaces," in Microphysics of Surfaces Nanoscale Processing, Technical Digest Series (Optica Publishing Group, 1995), paper MFA2.

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Abstract

There is great interest in the semiconductor industry in the development of light-scattering techniques for the detection of "killer particles" on silicon-wafer surfaces. One of the principal limitations in the performance of such devices is the presence of background scattering or "haze" due to scattering from the random residual microtopography of silicon surfaces [1].

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