Abstract

As electronic and magnetic devices continue to become smaller, the need for fabricating structures on the nanometer scale grows larger. In lithographic techniques, the fundamental limitation in making nano­scale structures is imposed by diffraction effects which limit the size of the structures to the order of the wavelength of light used. Consequently, technologies are being driven towards using photons of shorter wavelength and/or high energy electrons or ions to produce structures with the highest resolution.

© 1995 Optical Society of America