Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Nanoscale Characterization of InP Islands on InGaP(001)

Not Accessible

Your library or personal account may give you access

Abstract

Indium phosphide and its related alloys are widely used in optoelectronic materials and devices. Using InP in strained-layer material systems presents a way of producing nanostructures. From growth simulations of InAs/GaAs(001), Ghaisas and Madhukar [1] proposed that islands in registry with the substrate occur before defect formation. In addition, they predicted a critical volume for an island to be coherently strained to the substrate. After this critical volume is exceeded, dislocations or other defects can result. Recently, the existence of strain-induced coherent islands has been verified experimentally in other systems, i.e., Ge/Si(001)[2] and InGaAs/GaAs(001)[3-6], InP/InGaP(001)[7], and InP/GaAs(001)[8] and have all been shown to produce a single type of coherently strained island during growth.

© 1995 Optical Society of America

PDF Article
More Like This
InGaAs nanostructure formed by the Stranski – Krastanow growth mode on GaAs (311)A

P. O. Vaccaro, M. Hirai, K. Fujita, and T. Watanabe
QThG22 Quantum Electronics and Laser Science Conference (CLEO:FS) 1995

InAs QDs on (111)-faceted Si (001) hollow substrates with strong emission at 1300 nm and 1550 nm

Wen-Qi Wei, Ting Wang, and Jian-Jun Zhang
M2I.2 Asia Communications and Photonics Conference (ACP) 2018

1.32 μm room temperature photoluminescence from InGaAs quantum dots on GaAs

Richard Mirin, James Ibbetson, Kenichi Nishi, Arthur Gossard, and John Bowers
QThC3 Quantum Optoelectronics (QOE) 1995

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.