Photosensitivity functionalization of PDMS for femtosecond laser writing

Jean-Sébastien Boisvert; Antsar Hlil; Antsar Hlil; Antsar Hlil; Jyothis Thomas; Yalina Garcia-Puente; Ali Riaz; Yannick Ledemi; Younes Messaddeq; Younes Messaddeq; Raman Kashyap; Raman Kashyap; Raman Kashyap

doi:10.1364/NOMA.2020.NoTh1C.4

OSA Advanced Photonics Congress (AP) 2020 (IPR, NP, NOMA, Networks, PVLED, PSC, SPPCom, SOF)
OSA Technical Digest (Optica Publishing Group, 2020),
paper NoTh1C.4
•https://doi.org/10.1364/NOMA.2020.NoTh1C.4

Photosensitivity functionalization of PDMS for femtosecond laser writing

Jean-Sébastien Boisvert, Antsar Hlil, Jyothis Thomas, Yalina Garcia-Puente, Ali Riaz, Yannick Ledemi, Younes Messaddeq, and Raman Kashyap

Novel Optical Materials and Applications 2020

Washington, DC United States
13–16 July 2020
ISBN: 978-1-943580-79-8

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Polymer and Soft Optical Materials (NoTh1C)

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J. Boisvert, A. Hlil, J. Thomas, Y. Garcia-Puente, A. Riaz, Y. Ledemi, Y. Messaddeq, and R. Kashyap, "Photosensitivity functionalization of PDMS for femtosecond laser writing," in OSA Advanced Photonics Congress (AP) 2020 (IPR, NP, NOMA, Networks, PVLED, PSC, SPPCom, SOF), L. Caspani, A. Tauke-Pedretti, F. Leo, and B. Yang, eds., OSA Technical Digest (Optica Publishing Group, 2020), paper NoTh1C.4.

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Abstract

We demonstrate photosensitization of PDMS using a germanium derivative and benzophenone (BP) as photosensitizing agents. Femtosecond laser written structure featuring high phase shift are reported, opening the way of ultra-tunable photonics devices.

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