Abstract

Computer-generated binary phase gratings provide a means of generating large arrays of spots for illuminating optical logic devices. By using an optimization algorithm and choosing a suitable merit function, specific patterns can be found for a variety of array configurations. Although most of the spot intensities will scale uniformly with phase depth, the central or zero-order intensity scales in the opposite manner and with a much greater sensitivity to the phase error. Therefore, although a solution may theoretically provide superb spot intensity uniformity, the practicality of etching a grating to the critical depth may exceed the capabilities of the fabrication process.

© 1989 Optical Society of America