Abstract

We have developed a multifacet retroreflecting mirror substrate structure which can be coated with a fresh aluminum film in an ultrahigh vacuum (UHV) system and subsequently used for in situ reflectance measurements in the extreme ultraviolet (XUV). We utilize a gas discharge XUV source in combination with a 0.2-m Minuteman monochromator to illuminate the nine-facet mirror with a series of XUV wavelengths. The XUV beam is incident on each of the nine facets at 80° (from normal). An imaging microchannel plate detector is utilized to measure both the incident beam and the retroreflected beam in the UHV chamber.

© 1989 Optical Society of America