Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Optimum condition of second-harmonic generation in a medium with the second- and third-order nonlinear susceptibilities

Open Access Open Access

Abstract

Second-harmonic generation is investigated for a medium with second-and third-order nonlinear susceptibilities. All possible solutions assuming zero initial value for the second harmonic are obtained. Based on the analysis, the optimal condition for second-harmonic generation is deduced. A theoretical 100% conversion from the fundamental to the second harmonic is expected when the condition for phase optimization is met. Even when the condition is not satisfied, a possible best efficiency can be sought by estimating a figure of merit ΔT = (½|P|)|Δk/R–QR|, where R is the field intensity of input beam, Δk is the phase mismatch, and B and Q are combinations of the second- and third-order nonlinear susceptibilities, which depend on the angles between the optic axis and the input beam. Generally, as ΔT is reduced, a higher efficiency can be obtained. Hence, the concept of phase matching should be modified to that of phase optimization when the term QR is comparable with Δk/R. A higher efficiency will be obtained if the medium has higher B (i.e., the second-order nonlinearity) or if | Δk/R–QR | is minimized.

© 1990 Optical Society of America

PDF Article
More Like This
Electric field-induced permanent second-order susceptibility for second harmonic generation in optical fibers

LUKSUN LI, PAUL J. WELLS, ELIZABETH R. TAYLOR, and DAVID N. PAYNE
QTHO6 International Quantum Electronics Conference (IQEC) 1990

Calibratlon of third-order nonlinear optical susceptibilities via nonphasematched optical third-harmonic generation in noncentrosymmetric media

Ch. Bosshard, U. Gubler, P. Kaatz, U. Meier, and P. Günter
QThC5 Quantum Electronics and Laser Science Conference (CLEO:FS) 2000

Characterization of the Nonlinear Susceptibility of Monolayer MoS2 using Second- and Third-Harmonic Generation Microscopy

R. I. Woodward, R. T. Murray, C. F. Phelan, R. E. P. de Oliveira, S. Li, G. Eda, and C. J. S. de Matos
STu1R.3 CLEO: Science and Innovations (CLEO:S&I) 2016

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.