Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

High-contrast thin-film polarizers for Nd:glass laser systems

Not Accessible

Your library or personal account may give you access

Abstract

Thin-film polarizers are essential for efficient frequency conversion of high-energy lasers used for inertial fusion energy experiments. Many polarizer designs appear in the literature. Designs for single-wavelength devices are best compared by examining both the contrast ratio (Tp/Ts) and the throughput (Tp) as a function of the angle of incidence. A design using tantalum pentoxide/silicon dioxide is optimized for use at 1054 nm. These materials can be accurately controlled during deposition and have favorable damage characteristics. A method is described for accurate calibration of a physical thickness monitor in a planetary deposition system. A reflectometer modified to automatically measure the angular spectrum of contrast and throughput is essential for fine-tuning the design. Contrast ratios exceeding 1000:1 with throughput greater than 0.96 are realized on polarizers as large as 35 cm. The results for polarizers up to 60 cm (30 cm clear aperture) are presented. Performance of the polarizers on the 24-beam OMEGA laser is summarized.

© 1990 Optical Society of America

PDF Article
More Like This
Sputtered Nd: glass thin-film waveguide laser

Gordon R. J. Robertson and Paul E. Jessop
MO5 OSA Annual Meeting (FIO) 1990

Stimulated rotational Raman scattering in air with a high-power broadband laser

M. D. Skeldon and R. Bahr
MU2 OSA Annual Meeting (FIO) 1990

Multiterawatt subpicosecond Nd:glass laser system

M.D PERRY and F. G. PATTERSON
JMA3 Conference on Lasers and Electro-Optics (CLEO:S&I) 1990

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.