Abstract

Vacuum deposition techniques for boron nitride, aluminum nitride, and mixtures of the two materials have been developed. Starting materials of the pure metal or nitrides are electron-beam evaporated. The films are grown on glass, fused silica, and silicon substrates by reactive nitrogen ion-assisted deposition. A large 12 cm Kaufman-type ion source was used in this work. The goals of the study included development of these materials for visible-wa velength coatings and examination of the potential for Restrahlen mirrors in the infrared region. Matching deposition parameters that gave acceptable transmission characteristics in the visible spectrum for each material were developed. A technique was then developed to accomplish simultaneous codeposition of the two materials. Analysis of the films has been accomplished through both visible and infrared spectrophotometry. Results for boron nitride, aluminum nitride, and mixtures of the two are presented. Continuation work is planned to further develop these materials and expand the analysis techniques employed.

© 1990 Optical Society of America