Abstract

Our group has undertaken a program to determine the feasibility of using soft x-rays (wavelengths of ~13 nm) to carry out advanced projection lithography. Such a technology is attractive since it would offer the ability to use reduction imaging to achieve a resolution of >0.1 µm while maintaining a depth of focus >1 µm. We have already demonstrated the printing over a small area of features as small as 50 nm using a 20×-reduction optical system composed of mirrors and synchrotron radiation from an undulator at the National Synchrotron Light Source. A review of our most recent results is presented.

© 1991 Optical Society of America