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Possibilities for projection x-ray lithography using holographic optical elements

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Abstract

Projection x-ray lithography has received considerable attention recently as a way of pushing circuit feature size below the level at which proximity printing schemes become problematic. However, the optical figure tolerances for the projection systems usually discussed are well beyond the current state of the art. We consider the use of computer-generated holograms for printing circuit features. One scheme involves the use of an off-axis phase hologram written as surface height variations on a grazing incidence optical flat. Another scheme we have studied extensively through computer simulations involves the use of a transmission mask with material thickness variations designed in such a way that the magnitude and phase of the transmitted wavefield is controlled to produce the desired pattern with low noise and high contrast. Both schemes involve only modest extensions of existing technologies, and offer a route to x-ray projection lithography of sub-0.1-µm circuit features.

© 1991 Optical Society of America

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