Abstract

In near-field scanning optical microscopy (NSOM), a subwavelength source and/or detector of visible light is placed in close proximity (~λ/50) to a sample and raster scanned to generate images with a resolution well beyond the diffraction limit. Our recent development¹ of new near-field probes has resulted in a resolution of ~12 nm (~λ/43) concomitant with signals sufficient for dynamic imaging or adapting powerful optical contrast mechanisms to the near-field regime. Both transmission and reflection geometries have been demonstrated, indicating the applicability of NSOM to such diverse areas as pathology and semiconductor characterization. Luminescent and magnetooptic samples have been imaged, as well as phase objects (e.g., photoresist). Such results indicate that the versatility of NSOM should approach that of conventional far-field optical microscopy, because it retains many of the same advantages (e.g., noninvasiveness, informative contrast mechanisms, speed, low cost, and ease of use) while offering unprecedented spatial resolution.

© 1991 Optical Society of America