Advanced semiconductor lithography

César M. Garza

doi:10.1364/OAM.1993.MJJ.3

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Conferences > OAM > 1993 > MJJ > MJJ.3

OSA Annual Meeting
Technical Digest Series (Optica Publishing Group, 1993),
paper MJJ.3
•https://doi.org/10.1364/OAM.1993.MJJ.3

Advanced semiconductor lithography

César M. Garza

Author Information

Author Affiliations

César M. Garza

Semiconductor Process and Design Center, Texas Instrument Incorporated, P.O. Box 655012, MS: 944, Dallas, Texas 75265.

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C Garza

OSA Annual Meeting 1993

Toronto Canada
3–8 October 1993
ISBN:

From the session
Symposium on Lithography to the Year 2000: 1 (MJJ)

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C. M. Garza, "Advanced semiconductor lithography," in OSA Annual Meeting, Technical Digest Series (Optica Publishing Group, 1993), paper MJJ.3.

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Abstract

Abstract

Optical microlithography has been the enabling technology behind the spectacular growth of the integrated circuit industry over the last two decades.

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OSA Annual Meeting 1993
Toronto Canada
3–8 October 1993
ISBN:
From the session Symposium on Lithography to the Year 2000: 1 (MJJ)

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