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Conferences > OAM > 1993 > MJJ > MJJ.5

Measurement of astigmatism in microlithography lenses

Joseph P. Kirk

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Abstract

The direction, ϕ, and magnitude, A1, of residual astigmatism in microlithography lenses used for semiconductor circuit fabrication is determined by measuring the focal position, F, of lines orientated at four values of θ = 0°,45°, 90°, 135°.

© 1993 Optical Society of America

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