Measurement of GaAs quantum well index from distributed reflectance in resonant vertical structures

R. K. Hickernell; D. H. Christensen; J. Wang; J. P. Leburton

doi:10.1364/OAM.1993.MUU.7

OSA Annual Meeting
Technical Digest Series (Optica Publishing Group, 1993),
paper MUU.7
•https://doi.org/10.1364/OAM.1993.MUU.7

Measurement of GaAs quantum well index from distributed reflectance in resonant vertical structures

R. K. Hickernell, D. H. Christensen, J. Wang, and J. P. Leburton

OSA Annual Meeting 1993

Toronto Canada
3–8 October 1993
ISBN:

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Quantum-Well Devices and Applications (MUU)

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R. K. Hickernell, D. H. Christensen, J. Wang, and J. P. Leburton, "Measurement of GaAs quantum well index from distributed reflectance in resonant vertical structures," in OSA Annual Meeting, Technical Digest Series (Optica Publishing Group, 1993), paper MUU.7.

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Abstract

The accurate design and efficient operation of resonant, vertical-cavity devices such as surface-emitting lasers and Fabry-Perot modulators depend on accurate modeling of the complex refractive index of quantum wells.

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