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Conferences > OAM > 1993 > MYY > MYY.1

Phase-shifted masks for logic circuitry: process latitude versus integration

Lars W. Liebmann, Richard A. Ferguson, Ronald M. Martino, and Tracy J. Weed

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Abstract

Resolution enhanced lithography can be uniquely challenged by high-performance logic derivatives of advanced DRAM technologies.

© 1993 Optical Society of America

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