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Conferences > OAM > 1993 > MYY > MYY.2

Phase-shifting mask evaluation using a stepper-equivalent optical aerial image measurement system—AIMS

Russell A. Budd, Derek B. Dove, and John L. Staples

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Abstract

Phase shifting photolithographic masks (PSM) promise to extend the resolution and depth of focus of today’s optical steppers, (1).

© 1993 Optical Society of America

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