Realities of phase-shifting lithography

F. M. Schellenberg

doi:10.1364/OAM.1993.MYY.4

OSA Annual Meeting
Technical Digest Series (Optica Publishing Group, 1993),
paper MYY.4
•https://doi.org/10.1364/OAM.1993.MYY.4

Realities of phase-shifting lithography

F. M. Schellenberg

OSA Annual Meeting 1993

Toronto Canada
3–8 October 1993
ISBN:

From the session
Symposium on Lithography to the Year 2000: 2 (MYY)

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F. M. Schellenberg, "Realities of phase-shifting lithography," in OSA Annual Meeting, Technical Digest Series (Optica Publishing Group, 1993), paper MYY.4.

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Abstract

Phase-shifting has been discussed as a method for image resolution enhancement since the time of Lord Rayleigh [1], and the concept of phaseshifting for the improvement of photolithography has been with us for more than a decade [2].

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