Phase-contrast lithography

Chris A. Mack

doi:10.1364/OAM.1993.MYY.5

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Conferences > OAM > 1993 > MYY > MYY.5

OSA Annual Meeting
Technical Digest Series (Optica Publishing Group, 1993),
paper MYY.5
•https://doi.org/10.1364/OAM.1993.MYY.5

Phase-contrast lithography

Chris A. Mack

Author Information

Author Affiliations

Chris A. Mack

FINLE Technologies, P.O. Box 162712, Austin, TX 78716.

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C Mack

OSA Annual Meeting 1993

Toronto Canada
3–8 October 1993
ISBN:

From the session
Symposium on Lithography to the Year 2000: 2 (MYY)

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C. A. Mack, "Phase-contrast lithography," in OSA Annual Meeting, Technical Digest Series (Optica Publishing Group, 1993), paper MYY.5.

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Abstract

Abstract

The phase contrast microscope, first proposed by Fritz Zernike in 1935, uses spatial filtering to produce high contrast images of transparent samples.

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OSA Annual Meeting 1993
Toronto Canada
3–8 October 1993
ISBN:
From the session Symposium on Lithography to the Year 2000: 2 (MYY)

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