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Precision optical testing of a soft-x-ray camera at λ = 14 nm

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Abstract

One of the major challenges facing the soft x-ray projection lithography program is realizing high resolution, diffraction limited imaging. Even though near diffraction-limited images were obtained with two different x-ray cameras, at λ = 14 nm 1 and at λ = 42 nm 2, a quantitative characterization of the imaging capabilities of these systems is still lacking.

© 1993 Optical Society of America

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