Hot-electron mechanism for a de photorefractive phase shift

Q. N. Wang; R. M. Brubaker; D. D. Nolte; M. R. Melloch

doi:10.1364/OAM.1993.ThDD.47

OSA Annual Meeting
Technical Digest Series (Optica Publishing Group, 1993),
paper ThDD.47
•https://doi.org/10.1364/OAM.1993.ThDD.47

Hot-electron mechanism for a dc photorefractive phase shift

Q. N. Wang, R. M. Brubaker, D. D. Nolte, and M. R. Melloch

OSA Annual Meeting 1993

Toronto Canada
3–8 October 1993
ISBN:

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OSA Poster Session: 2 (ThDD)

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Q. N. Wang, R. M. Brubaker, D. D. Nolte, and M. R. Melloch, "Hot-electron mechanism for a de photorefractive phase shift," in OSA Annual Meeting, Technical Digest Series (Optica Publishing Group, 1993), paper ThDD.47.

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Abstract

Photorefractive AlGaAs/GaAs multiple quantum well structures exhibit strong photorefractive two wave mixing¹ in the transverse-field geometry. The phase shift of the photorefractive grating approaches π/2 for DC fields above E_c = 4 kV/cm. The four-wave mixing diffraction efficiency² saturates for fields larger than E_c.

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