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Conferences > ODS > 1983 > THB > THB2

The Resistance to Oxidation of Te-Se Optical Recording Films

Motoyasu Terao, Shinkichi Horigome, Kazuo Shigematsu, Yasushi Miyauchi, and Masatoshi Nakazawa

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Abstract

It has already been reported that recording thin films for optical disk which are mainly composed of Te have high performance1),2),3). It is also known that the resistance to oxidation is greatly improved by addition of Se2). This paper reports details of the tests on resistance to oxidation of Te-Se thin films, the relation of substrate surface materials and oxidation rates, and effects of additional metallic elements such as Pb, Bi, Sb, Sn, Pb and As on microcrystal growth.

© 1983 Optical Society of America

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