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Optica Publishing Group
  • 2013 18th OptoElectronics and Communications Conference held jointly with 2013 International Conference on Photonics in Switching
  • (Optica Publishing Group, 2013),
  • paper WM2_1
  • https://doi.org/10.1364/OECC_PS.2013.WM2_1

Si Wire Array Waveguide Grating with Reduced Phase Error: Effect of advanced lithography process

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Abstract

We report the Si wire AWG without systematic phase error generated at the curved waveguides. A 200GHz spacing 16 channel devices were fabricated by ArF immersion and EB lithography and the results are compared.

© 2013 IEICE

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