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Status and prognosis for plasma MCVD

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Abstract

The rf plasma enhanced MCVD process has demonstrated encouraging results for high-rate preparation of lightguide preforms with excellent optical and dimensional properties in the resultant fiber. A second generation plasma facility has recently been constructed which incorporates improved design features including computer automation and control, a high-rate delivery system, and new rf plasma generation design features.

© 1983 Optical Society of America

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