Abstract
In the past year it has been reported1,2 that Bragg phase gratings can be written in H2-sensitized P-doped waveguides by using ArF excimer irradiation (193 nm). This is significant for waveguide and fiber applications using P-doped materials1,3 that do not contain Ge, the photosensitive dopant used in previous fiber and waveguide UV-induced Bragg reflector applications. We report the fabrication of Bragg phase gratings written in a P-doped silica fiber containing no Ge. The strong Bragg reflectors obtained indicate this fiber is significantly more photosensitive than the previously reported waveguide materials.1,2
© 1995 Optical Society of America
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