O-Band Silicon Photonic Bragg-Grating Multiplexers Using UV Lithography

Jonathan St-Yves; Sophie Larochelle; Wei Shi

doi:10.1364/OFC.2016.Tu2F.7

Optical Fiber Communication Conference
OSA Technical Digest (online) (Optica Publishing Group, 2016),
paper Tu2F.7
•https://doi.org/10.1364/OFC.2016.Tu2F.7

O-Band Silicon Photonic Bragg-Grating Multiplexers Using UV Lithography

Jonathan St-Yves, Sophie Larochelle, and Wei Shi

Optical Fiber Communication Conference 2016

Anaheim, California United States
20–22 March 2016
ISBN: 978-1-943580-07-1

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Wavelength Filtering (Tu2F)

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J. St-Yves, S. Larochelle, and W. Shi, "O-Band Silicon Photonic Bragg-Grating Multiplexers Using UV Lithography," in Optical Fiber Communication Conference, OSA Technical Digest (online) (Optica Publishing Group, 2016), paper Tu2F.7.

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Abstract

We demonstrate the first Bragg-grating-based 4-channel O-band (de-)multiplexer fabricated using 193nm lithography on submicron-SOI with small features below 140nm.

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