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Conferences > OFC > 2017 > Tu3K > Tu3K.1

High efficient suspended coupler based on IME’s MPW platform with 193nm lithography

Jia Lianxi, Liow Tsung-Yang, Li Chao, Luo Xianshu, Tu Xiaoguang, Huang Ying, Zhou Haifeng, Yu Mingbin, and Patrick Lo

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Abstract

Benefiting from the new 193nm lithography, a narrow tip with width of 100 nm can be fabricated on IME’s MPW platform. Based on the new capability, we optimized the suspended coupler and realized the state-of-the-art coupling loss less than -1.3 dB/facet with cleaved single mode fiber. A uniformity of 0.4 dB across wafers has also been confirmed, the best performance to our knowledge realized in public-available silicon photonics platform.

© 2017 Optical Society of America

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