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Comparison of Al2O3 and HfO2 MOSCAP III-V/Si Power Splitters and (De-) Interleavers for DWDM Optical Links

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Abstract

We compare III-V/Si MZIs and (de-)interleavers using Al2O3- and HfO2-based MOSCAP structures as phase tuners. HfO2 twice as thick as Al2O3 exhibited lower VπL. We demonstrate crosstalk improvement of ring-assisted (de-)interleavers with both structures.

© 2022 The Author(s)

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