Fuzzy Analysis For Fabricating Hoe In Photoresist

Rong-Seng Chang; Chern Sheng Lin; C. P. Hu

doi:10.1364/OFT.1992.WA14

Optical Fabrication and Testing Workshop
Technical Digest Series (Optica Publishing Group, 1992),
paper WA14
•https://doi.org/10.1364/OFT.1992.WA14

Fuzzy Analysis For Fabricating Hoe In Photoresist

Rong-Seng Chang, Chern Sheng Lin, and C. P. Hu

Optical Fabrication and Testing 1992

Boston, Massachusetts United States
17–19 November 1992
ISBN:

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Metrology (WA)

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R. Chang, C. S. Lin, and C. P. Hu, "Fuzzy Analysis For Fabricating Hoe In Photoresist," in Optical Fabrication and Testing Workshop, Technical Digest Series (Optica Publishing Group, 1992), paper WA14.

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Abstract

Surface relief holograms have intrinsic nonlinearity. A very important step in fuzzy analysis of HOE fabricating process is to choice parameters from procedure for making photoresist hologram. We select some parameters for the reason we can’t fix it or control it in a economic process, and some parameters for the sake of compensation.

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