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Specifications and Metrology of Surface Figure and Finish for Microlithography Optics

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Abstract

Optical lithography has come a long way since the initial days of projection lithography in the early 70's. In the last two decades the resolution has increased by an order of magnitude, the numerical apertures used have gone from .16 to values higher than .5 and the wavelength has gone to deep UV (248nm) and is likely to go even shorter in the not too distant future. Pretty good for a technology that was supposed to be dead by the early eighties!

© 1996 Optical Society of America

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