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Conferences > OFT > 1996 > JThB > JThB.3

Surface characterization of optics for EUV lithography

D. P. Gaines, K.W. DeLong, S.P. Vernon, D.G. Stearns, D.W. Sweeney, S.L. Baker, D. A. Tichenor, and R. Kestner

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Abstract

The surface topography of optics for extreme ultraviolet lithography (EUVL) must be precisely controlled from spatial scales extending from the full aperture (~50mm) to the wavelength of illumination (~13nm), or 7 orders of magnitude. Measurement and control of an optical surface over this range of spatial scales is challenging. This paper will present bare-surface PSD surface descriptions over these spatial scales for state-of-the-art EUVL optics.

© 1996 Optical Society of America

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