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The Extreme-UV Lithography program requires aspheric mirrors that are superpolished and have an RMS figure accuracy of 0.1 to 0.3 nm. At present, neither requirement has been met on aspheric mirrors. We propose to achieve this accuracy by depositing a variable thickness coatings on precision superpolished mirrors. This is an extension of the work presented in the 1996 EUVL Topical Meeting (OSA TOPS Vol. IV, p. 149-151).
© 1998 Optical Society of America
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